文章信息/Info

Title:

Progress in Gasochromic WO3 Thin Films Deposited by Magnetron Sputtering

作者:

溫佳星; 王美涵; 彭洋; 王新宇; 侯朝霞; 王少洪; 胡小丹

沈陽大學(xué)機(jī)械工程學(xué)院

Author(s):

WEN Jiaxing; WANG Meihan; PENG Yang; WANG Xinyu; HOU Zhaoxia; WANG Shaohong; HU Xiaodan

School of Mechanical Engineering，Shenyang University

關(guān)鍵詞:

WO3薄膜; 磁控濺射; 掠射角; 納米結(jié)構(gòu); 氣致變色

DOI:

10.7502/j.issn.1674-3962.2016.01.08

文獻(xiàn)標(biāo)志碼:

A

摘要:

氧化鎢薄膜因其特殊的物理化學(xué)性質(zhì)，在智能窗、傳感器等諸多新領(lǐng)域具有廣泛的應(yīng)用前景。為使WO3薄膜氣致變色特性得到良好的應(yīng)用，需要制備新型納米結(jié)構(gòu)氧化鎢薄膜。磁控濺射是工業(yè)制備WO3薄膜的有效方法之一。掠射角磁控濺射是在傳統(tǒng)磁控濺射基礎(chǔ)上發(fā)展的新型薄膜制備技術(shù)，通過將襯底傾斜一定角度，可制備出具有高結(jié)晶度、大比表面積、排列規(guī)則的納米結(jié)構(gòu)WO3薄膜。綜述了氧分壓、濺射功率及熱處理等磁控濺射參數(shù)對WO3薄膜組成、形貌、晶體結(jié)構(gòu)等的影響，重點(diǎn)介紹了具有獨(dú)特優(yōu)勢的掠射角磁控濺射技術(shù)，及利用其制備得到的納米結(jié)構(gòu)WO3薄膜在智能窗和氣體傳感器等方面的應(yīng)用，提出了掠射角磁控濺射制備納米結(jié)構(gòu)WO3薄膜存在的問題及未來發(fā)展趨勢。

Abstract:

Tungsten oxide thin films have wide applications in the fields of smart windows and sensors due to their special physical and chemical properties. To make tungsten oxide thin films with gasochromic property in practical applications， novel nanostructured WO3 thin films are needed to be produced. Magnetron sputtering is an effective method to produce WO3 thin films in industry. Glancing angle magnetron sputtering deposition is a new technology which is developed based on traditional magnetron sputtering， and it is used to deposit high crystalline， large surface area and well-ordered nanostructured WO3 thin films by inclining the substrate to a certain angle. In this paper， the effects of magnetron sputtering parameters， including oxygen partial pressure， annealing temperature and deposition power on the composition， morphology and crystal structure of WO3 thin films are summarized. The unique advantages of glancing angle magnetron sputtering are emphasized. The applications of nanostructured tungsten oxide thin films on smart windows and gas sensors are introduced. Finally， the problems inhered in glancing angle magnetron sputtering deposition of tungsten oxide thin films and its future developments are proposed.